发明授权
- 专利标题: Metrology targets with filling elements that reduce inaccuracies and maintain contrast
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申请号: US14605425申请日: 2015-01-26
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公开(公告)号: US10002806B2公开(公告)日: 2018-06-19
- 发明人: Nuriel Amir , Raviv Yohanan
- 申请人: KLA-Tencor Corporation
- 申请人地址: US CA Milpitas
- 专利权人: KLA-Tencor Corporation
- 当前专利权人: KLA-Tencor Corporation
- 当前专利权人地址: US CA Milpitas
- 代理机构: Suiter Swantz pc llo
- 主分类号: G06F17/50
- IPC分类号: G06F17/50 ; H01L21/66 ; G01N21/47
摘要:
The subject application relates to metrology targets with filling elements that reduce inaccuracies and maintain contrast. The present invention provides a metrology target and a method to design the metrology target. The metrology target comprises specified filling elements introduced into identified continuous regions in a given target design, wherein parameters of the introduced filling elements are determined by a trade-off between a contrast requirement and an inaccuracy requirement which is associated via production with the identified continuous regions. The method includes the steps of identifying continuous regions in a target design, and introducing specified filling elements into the identified continuous regions, wherein parameters of the introduced filling elements are determined by a trade-off between a contrast requirement and an inaccuracy requirement which is associated via production with the identifying continuous regions. At least one of the identifying and the introducing can be carried out by at least one computer processor.
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