Invention Grant
- Patent Title: Metrology targets with filling elements that reduce inaccuracies and maintain contrast
-
Application No.: US14605425Application Date: 2015-01-26
-
Publication No.: US10002806B2Publication Date: 2018-06-19
- Inventor: Nuriel Amir , Raviv Yohanan
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Suiter Swantz pc llo
- Main IPC: G06F17/50
- IPC: G06F17/50 ; H01L21/66 ; G01N21/47

Abstract:
The subject application relates to metrology targets with filling elements that reduce inaccuracies and maintain contrast. The present invention provides a metrology target and a method to design the metrology target. The metrology target comprises specified filling elements introduced into identified continuous regions in a given target design, wherein parameters of the introduced filling elements are determined by a trade-off between a contrast requirement and an inaccuracy requirement which is associated via production with the identified continuous regions. The method includes the steps of identifying continuous regions in a target design, and introducing specified filling elements into the identified continuous regions, wherein parameters of the introduced filling elements are determined by a trade-off between a contrast requirement and an inaccuracy requirement which is associated via production with the identifying continuous regions. At least one of the identifying and the introducing can be carried out by at least one computer processor.
Public/Granted literature
- US20150227675A1 METROLOGY TARGETS WITH FILLING ELEMENTS THAT REDUCE INACCURACIES AND MAINTAIN CONTRAST Public/Granted day:2015-08-13
Information query