发明授权
- 专利标题: Curable composition
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申请号: US15430941申请日: 2017-02-13
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公开(公告)号: US10005856B2公开(公告)日: 2018-06-26
- 发明人: Yuusuke Iizuka , Satoshi Sano , Keisuke Kodama , Sotaro Inomata , Kuniyuki Kaminaga
- 申请人: FUJIFILM Corporation
- 申请人地址: JP Tokyo
- 专利权人: FUJIFILM Corporation
- 当前专利权人: FUJIFILM Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Birch, Stewart, Kolasch & Birch, LLP
- 优先权: JP2014-173958 20140828
- 主分类号: C08F22/38
- IPC分类号: C08F22/38 ; B01J39/20 ; B01J47/12 ; B01D61/46 ; B01D71/40 ; C07C309/15 ; C07C309/51 ; B01D53/22 ; B01D61/00 ; B01D61/02 ; B01D61/42 ; C07C303/32
摘要:
Provided are a curable composition including an amide compound that is represented by Formula (1) below and of which a density of sulfonic acid is 3.9 milliequivalent/g or greater. m represents an integer of 1 or greater, n represents an integer of 2 or greater, L1 represents a m+1-valent linking group, and L2 represents an n-valent linking group. R1 represents a hydrogen atom or an alkyl group, and R2 represents —SO3−M+ or —SO3R3 (R3 represents an alkyl group or an aryl group). Here, in a case where there are plural R2's, not all of the R2's are —SO3R3. M+ represents a hydrogen ion, an inorganic ion, or an organic ion.
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