Invention Grant
- Patent Title: Single semiconductor crystal structure having an improved structure for crystalline lattice mismatch, semiconductor device and method of manufacturing same
-
Application No.: US15363139Application Date: 2016-11-29
-
Publication No.: US10014173B2Publication Date: 2018-07-03
- Inventor: Ji Eon Yoon , Chul Kim , Sang Moon Lee , Seung Ryul Lee
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Yeongtong-gu, Suwon-si, Gyeonggi-do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Yeongtong-gu, Suwon-si, Gyeonggi-do
- Agency: Muir Patent Law, PLLC
- Priority: KR10-2015-0188778 20151229
- Main IPC: H01L29/32
- IPC: H01L29/32 ; H01L21/02

Abstract:
A semiconductor single crystal structure may include a substrate; a defect trapping stack disposed on the substrate; and a semiconductor single crystal disposed on the defect trapping stack, and having a lattice mismatch with a crystal of the substrate, in which the defect trapping stack may include a first dielectric layer disposed on the substrate, and having at least one first opening, a second dielectric layer disposed on the first dielectric layer, and having at least one second opening, a third dielectric layer disposed on the second dielectric layer, and having at least one third opening, and a fourth dielectric layer disposed on the third dielectric layer, and having at least one fourth opening, and in which the semiconductor single crystal may extend to a region of the substrate defined in the at least one first opening through the at least one first to fourth opening.
Public/Granted literature
- US20170186609A1 SINGLE SEMICONDUCTOR CRYSTAL STRUCTURE, SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SAME Public/Granted day:2017-06-29
Information query
IPC分类: