Invention Grant
- Patent Title: Method to protect features during repair cycle
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Application No.: US14945824Application Date: 2015-11-19
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Publication No.: US10030305B2Publication Date: 2018-07-24
- Inventor: Jared Hogg Weaver , Gregory Scot Corman , Anteneh Kebbede , Daniel Gene Dunn , Jerome Geoffrey Magnant
- Applicant: GENERAL ELECTRIC COMPANY
- Applicant Address: US NY Schenectady
- Assignee: GENERAL ELECTRIC COMPANY
- Current Assignee: GENERAL ELECTRIC COMPANY
- Current Assignee Address: US NY Schenectady
- Agency: GE Global Patent Operation
- Agent John Darling
- Main IPC: B44C1/22
- IPC: B44C1/22 ; C03C15/00 ; C03C25/68 ; C23F1/00 ; C23C16/04
Abstract:
A method can include applying a mask to a CMC structure, and subjecting the structure having an applied mask to a process for repair. In one embodiment, the applying a mask to a CMC structure can include applying a mask to a feature of a CMC structure.
Public/Granted literature
- US20170145560A1 METHOD TO PROTECT FEATURES DURING REPAIR CYCLE Public/Granted day:2017-05-25
Information query
