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公开(公告)号：US10030305B2
公开(公告)日：2018-07-24
申请号：US14945824
申请日：2015-11-19
Applicant: GENERAL ELECTRIC COMPANY
Inventor： Jared Hogg Weaver , Gregory Scot Corman , Anteneh Kebbede , Daniel Gene Dunn , Jerome Geoffrey Magnant
Abstract: A method can include applying a mask to a CMC structure, and subjecting the structure having an applied mask to a process for repair. In one embodiment, the applying a mask to a CMC structure can include applying a mask to a feature of a CMC structure.
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