Invention Grant
- Patent Title: Nanotube structure based metal damascene process
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Application No.: US14738967Application Date: 2015-06-15
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Publication No.: US10043750B2Publication Date: 2018-08-07
- Inventor: Ravi Joshi , Juergen Steinbrenner
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Viering, Jentschura & Partner mbB
- Main IPC: H01L23/528
- IPC: H01L23/528 ; H01L21/02 ; H01L21/768 ; H01L23/532 ; H01L21/285 ; H01L21/311

Abstract:
In various embodiments a method for manufacturing a metallization layer on a substrate is provided, wherein the method may include forming a plurality of groups of nanotubes over a substrate, wherein the groups of nanotubes may be arranged such that a portion of the substrate is exposed and forming metal over the exposed portion of the substrate between the plurality of groups of nanotubes.
Public/Granted literature
- US20150311157A1 NANOTUBE STRUCTURE BASED METAL DAMASCENE PROCESS Public/Granted day:2015-10-29
Information query
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