Invention Grant
- Patent Title: Photo-imprinting resin composition, photo-imprinting resin film and patterning process
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Application No.: US15085569Application Date: 2016-03-30
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Publication No.: US10048582B2Publication Date: 2018-08-14
- Inventor: Yaw-Ting Wu , Ping-Chen Chen
- Applicant: Industrial Technology Research Institute
- Applicant Address: TW Hsinchu
- Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Current Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Current Assignee Address: TW Hsinchu
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: TW104142230A 20151216
- Main IPC: G03F7/00
- IPC: G03F7/00 ; C09D133/14 ; C09D133/16 ; C08L63/04
Abstract:
A photo-imprinting resin composition, a photo-imprinting resin film and a patterning process are provided. The photo-imprinting resin composition includes a novolac resin; a monomer having acrylic group, a polymer having acrylic group or a combination thereof; and a radical type photopolymerization initiator. The novolac resin has a Mw of 500 to 50000. The novolac resin does not react with the monomer having acrylic group nor the polymer having acrylic group described above.
Public/Granted literature
- US20170176852A1 PHOTO-IMPRINTING RESIN COMPOSITION, PHOTO-IMPRINTING RESIN FILM AND PATTERNING PROCESS Public/Granted day:2017-06-22
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