- 专利标题: System and method for determining dosimetry in ophthalmic photomedicine
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申请号: US14951417申请日: 2015-11-24
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公开(公告)号: US10052229B2公开(公告)日: 2018-08-21
- 发明人: Daniel V. Palanker , Dan E. Andersen
- 申请人: Topcon Medical Laser Systems, Inc.
- 申请人地址: US CA Santa Clara
- 专利权人: Topcon Medical Laser Systems, Inc.
- 当前专利权人: Topcon Medical Laser Systems, Inc.
- 当前专利权人地址: US CA Santa Clara
- 代理机构: Dentons US LLP
- 主分类号: A61B18/18
- IPC分类号: A61B18/18 ; A61F9/008 ; A61B18/20 ; A61N5/06 ; A61B90/00 ; A61B3/10
摘要:
A system and method for treating ophthalmic target tissue, including a light source for generating a beam of light, a beam delivery system that includes a scanner for generating patterns, and a controller for controlling the light source and delivery system to create a dosimetry pattern of the light beam on the ophthalmic target tissue. One or more dosage parameters of the light beam vary within the dosimetry pattern, to create varying exposures on the target tissue. A visualization device observes lesions formed on the ophthalmic target tissue by the dosimetry pattern. The controller selects dosage parameters for the treatment beam based upon the lesions resulting from the dosimetry pattern, either automatically or in response to user input, so that a desired clinical effect is achieved by selecting the character of the lesions as determined by the dosimetry pattern lesions.
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