Invention Grant
- Patent Title: Method and apparatus for analyzing and for removing a defect of an EUV photomask
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Application No.: US14137731Application Date: 2013-12-20
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Publication No.: US10060947B2Publication Date: 2018-08-28
- Inventor: Michael Budach , Tristan Bret , Klaus Edinger , Thorsten Hofmann
- Applicant: Carl Zeiss SMT GmbH
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Fish & Richardson P.C.
- Priority: DE102011079382 20110719
- Main IPC: G01Q30/02
- IPC: G01Q30/02 ; G03F1/22 ; G03F1/84 ; G03F1/86 ; B82Y10/00 ; B82Y40/00

Abstract:
The invention refers to a method for analyzing a defect of an optical element for the extreme ultra-violet wavelength range comprising at least one substrate and at least one multi-layer structure, the method comprising the steps: (a) determining first data by exposing the defect to ultra-violet radiation, (b) determining second data by scanning the defect with a scanning probe microscope, (c) determining third data by scanning the defect with a scanning particle microscope, and (d) com-bining the first, the second and the third data.
Public/Granted literature
- US20140165236A1 METHOD AND APPARATUS FOR ANALYZING AND FOR REMOVING A DEFECT OF AN EUV PHOTOMASK Public/Granted day:2014-06-12
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