- 专利标题: Metrology target, method and apparatus, target design method, computer program and lithographic system
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申请号: US15477602申请日: 2017-04-03
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公开(公告)号: US10061212B2公开(公告)日: 2018-08-28
- 发明人: Maurits Van Der Schaar , Richard Johannes Franciscus Van Haren , Everhardus Cornelis Mos , Youping Zhang
- 申请人: ASML Netherlands B.V.
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- 主分类号: G03F7/20
- IPC分类号: G03F7/20 ; H01L21/66 ; H01L23/544
摘要:
Disclosed is a method of measuring a target, associated substrate comprising a target and computer program. The target comprises overlapping first and second periodic structures. The method comprising illuminating the target with measurement radiation and detecting the resultant scattered radiation. The pitch of the second periodic structure is such, relative to a wavelength of the measurement radiation and its angle of incidence on the target, that there is no propagative non-zeroth diffraction at the second periodic structure resultant from said measurement radiation being initially incident on said second periodic structure. There may be propagative non-zeroth diffraction at the second periodic structure which comprises further diffraction of one or more non-zero diffraction orders resultant from diffraction by the first periodic structure. Alternatively, the detected scattered radiation may comprise non-zero diffraction orders obtained from diffraction at said the periodic structure which have been disturbed in the near field by the second periodic structure.
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