Invention Grant
- Patent Title: Method of manufacturing pellicle assembly and method of photomask assembly including the same
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Application No.: US15014054Application Date: 2016-02-03
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Publication No.: US10065402B2Publication Date: 2018-09-04
- Inventor: Mun Ja Kim , Byung-Gook Kim , Hwan Chul Jeon , Ji-Beom Yoo , Dong-Wook Shin , Taesung Kim , Sooyoung Kim
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si, Gyeonggi-do KR Suwon-si, Gyeonggi-do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.,RESEARCH & BUSINESS FOUNDATION SUNGKYUNK WAN UNIVERSITY
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.,RESEARCH & BUSINESS FOUNDATION SUNGKYUNK WAN UNIVERSITY
- Current Assignee Address: KR Suwon-si, Gyeonggi-do KR Suwon-si, Gyeonggi-do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2015-0079200 20150604
- Main IPC: B32B37/14
- IPC: B32B37/14 ; B32B38/18 ; B32B37/00 ; G03F1/62 ; B32B37/10 ; B32B38/10 ; B32B37/12 ; H01L21/00 ; B32B38/16
Abstract:
A method of manufacturing a pellicle assembly, the method including attaching a carbon-containing thin film onto a transfer membrane in a wet atmosphere; attaching the carbon-containing thin film to a pellicle frame in a dry atmosphere while the carbon-containing thin film is attached onto the transfer membrane; and separating the transfer membrane from the carbon-containing thin film while the carbon-containing thin film is attached to the pellicle frame.
Public/Granted literature
- US20160355001A1 METHOD OF MANUFACTURING PELLICLE ASSEMBLY AND METHOD OF PHOTOMASK ASSEMBLY INCLUDING THE SAME Public/Granted day:2016-12-08
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