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1.发明授权公开(公告)号：US11381388B2
公开(公告)日：2022-07-05
申请号：US16674413
申请日：2019-11-05
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Hyunsook Hong , Jintaek Kwon , Myeongjong Lee , Seung-Jae Lee , Seokgi Hong , Byung-Gook Kim , Jisoo Kim
Abstract: A storage device includes a nonvolatile memory device, and a controller that manages a data encryption key (DEK). The DEK is used to encrypt data to be written in a storage space of the nonvolatile memory device by a first user and to decrypt data read from the storage space. The controller grants a second user authority to access the storage space by encrypting the DEK based on a Diffie-Hellman (DH) algorithm, grants a second user authority to access the encrypted DEK, and decrypts the encrypted DEK based on the DH algorithm.
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公开(公告)号：US10042246B2
公开(公告)日：2018-08-07
申请号：US15225918
申请日：2016-08-02
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Jong-Keun Oh , Hyung-Ho Ko , Byung-Gook Kim , Jae-Hyuck Choi , Jun-Youl Choi
Abstract: A photomask includes a transparent substrate, a mask pattern formed on the substrate, and a protective layer pattern covering side walls of the mask pattern, wherein a top of the protective layer pattern is exposed.
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公开(公告)号：US11415889B2
公开(公告)日：2022-08-16
申请号：US16445969
申请日：2019-06-19
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Jong-Keun Oh , Kyoung-Noh Kim , Man-Kyu Kang , Byung-Gook Kim
IPC: G03G15/10 , G03F7/30 , B05B1/00 , B05C5/00 , H01L21/67 , B41J2/16 , G03F7/20 , G03F7/00 , G03F7/32 , B05B1/28 , B05C5/02 , B05C11/10 , H01L21/687
Abstract: A chemical supply structure includes a bar-shaped body having a plurality of chemical reservoirs in which a plurality of chemicals is individually stored such that the body partially crosses an underlying substrate, a bar-shaped nozzle protruded from a bottom surface of the body and injecting injection chemicals onto the substrate, a plurality of the chemicals being mixed into the injection chemicals, and a hydrophobic unit arranged on the bottom surface of the body and on a side surface of the nozzle such that a mixed solution mixed with the injection chemicals is prevented from adhering to the bottom surface and the side surface by controlling a contact angle of the mixed solution with respect to the bottom surface and the side surface.
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公开(公告)号：US09798241B2
公开(公告)日：2017-10-24
申请号：US14983851
申请日：2015-12-30
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Sang-Hyun Kim , Dong-Gun Lee , Byoung-Hun Park , Byung-Gook Kim , Chan-Uk Jeon
IPC: C03C15/00 , G03F7/38 , H01L21/027 , G03F1/00 , H01L21/311 , H01L27/108 , H01L21/768
CPC classification number: G03F7/38 , G03F1/00 , H01L21/0273 , H01L21/0274 , H01L21/0275 , H01L21/266 , H01L21/31144 , H01L21/76802 , H01L27/10814 , H01L27/10876 , H01L27/10888
Abstract: A method of patterning a photoresist layer includes forming a photoresist layer on a substrate, exposing the photoresist layer to light using a first light source so as to induce a chemical change in the photoresist layer, performing a post-exposure bake process on the photoresist layer, the post-exposure bake process including irradiating the photoresist layer with at least two shots of laser light from a second light source such that the photoresist layer is heated to a first temperature, and performing a developing process on the photoresist layer after the post-exposure bake process, the development process selectively removing a portion of the photoresist layer.
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Patent Agency Ranking
5.发明授权公开(公告)号：US10065402B2
公开(公告)日：2018-09-04
申请号：US15014054
申请日：2016-02-03
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Mun Ja Kim , Byung-Gook Kim , Hwan Chul Jeon , Ji-Beom Yoo , Dong-Wook Shin , Taesung Kim , Sooyoung Kim
IPC: B32B37/14 , B32B38/18 , B32B37/00 , G03F1/62 , B32B37/10 , B32B38/10 , B32B37/12 , H01L21/00 , B32B38/16
Abstract: A method of manufacturing a pellicle assembly, the method including attaching a carbon-containing thin film onto a transfer membrane in a wet atmosphere; attaching the carbon-containing thin film to a pellicle frame in a dry atmosphere while the carbon-containing thin film is attached onto the transfer membrane; and separating the transfer membrane from the carbon-containing thin film while the carbon-containing thin film is attached to the pellicle frame.
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公开(公告)号：US09892500B2
公开(公告)日：2018-02-13
申请号：US14710872
申请日：2015-05-13
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Hyung-Joo Lee , Won-Joo Park , Seuk-Hwan Choi , Byung-Gook Kim , Dong-Hoon Chung
CPC classification number: G06T7/0004 , G05B2219/45027 , G06T2207/10061 , G06T2207/30148
Abstract: A method for measuring a critical dimension of a mask pattern, including generating a mask pattern using an optically proximity-corrected (OPC) mask design including at least one block; measuring a first critical dimension of a target-region of interest (target-ROI) including neighboring blocks having a same critical dimension (CD), in the mask pattern; determining a group region of interest including the target-ROI and at least one neighboring block adjacent to the target-ROI; measuring second CDs of the neighboring blocks of the group region of interest; and correcting a measuring value of the first CD using a measuring value of the second CDs.
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公开(公告)号：US09417518B2
公开(公告)日：2016-08-16
申请号：US14217976
申请日：2014-03-18
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Jong-Keun Oh , Hyung-Ho Ko , Byung-Gook Kim , Jae-Hyuck Choi , Jun-Youl Choi
Abstract: A photomask includes a transparent substrate, a mask pattern formed on the substrate, and a protective layer pattern covering side walls of the mask pattern, wherein a top of the protective layer pattern is exposed.
Abstract translation: 光掩模包括透明基板，形成在基板上的掩模图案以及覆盖掩模图案的侧壁的保护层图案，其中保护层图案的顶部被暴露。
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8.发明申请公开(公告)号：US20200169395A1
公开(公告)日：2020-05-28
申请号：US16674413
申请日：2019-11-05
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Hyunsook Hong , Jintaek Kwon , Myeongjong Lee , Seung-Jae Lee , Seokgi Hong , Byung-Gook Kim , Jisoo Kim
Abstract: A storage device includes a nonvolatile memory device, and a controller that manages a data encryption key (DEK). The DEK is used to encrypt data to be written in a storage space of the nonvolatile memory device by a first user and to decrypt data read from the storage space. The controller grants a second user authority to access the storage space by encrypting the DEK based on a Diffie-Hellman (DH) algorithm, grants a second user authority to access the encrypted DEK, and decrypts the encrypted DEK based on the DH algorithm.
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公开(公告)号：US09690190B2
公开(公告)日：2017-06-27
申请号：US14969645
申请日：2015-12-15
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Mun-Ja Kim , Tae-Sung Kim , Ji-Beom Yoo , Byung-Gook Kim , Soo-Young Kim , Dong-Wook Shin , Jae-Hyuck Choi
IPC: G03F1/62 , C01B31/04 , C23C16/01 , C23C16/26 , C23F1/14 , C23C16/56 , C23F1/00 , G03F1/64 , C23F1/02
CPC classification number: G03F1/62 , C01B32/182 , C01B32/194 , C01B32/20 , C23C16/01 , C23C16/26 , C23C16/56 , C23F1/00 , C23F1/02 , C23F1/14 , G03F1/64
Abstract: A method of manufacturing a pellicle includes forming a membrane on a first surface of a substrate from a chemical reaction in which the substrate serves as a catalyst, forming a protective pattern on a second surface of the substrate, immersing the substrate in an etchant solution, such that a portion of the substrate exposed through the protective pattern is removed to form a frame, and replacing the etchant solution with a solvent.
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