Invention Grant
- Patent Title: Mask plate, mask exposure device and mask exposure method
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Application No.: US14894147Application Date: 2015-07-20
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Publication No.: US10067417B2Publication Date: 2018-09-04
- Inventor: Seiji Fujino , Song Zhang , Tao Wang , Jing Gao , Xiaobo Du
- Applicant: BOE TECHNOLOGY GROUP CO., LTD.
- Applicant Address: CN Beijing
- Assignee: BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee: BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee Address: CN Beijing
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: CN201510136925 20150326
- International Application: PCT/CN2015/084445 WO 20150720
- International Announcement: WO2016/150043 WO 20160929
- Main IPC: G03F1/38
- IPC: G03F1/38 ; G03F1/76 ; G03F7/20

Abstract:
The present disclosure provides a mask plate, a mask exposure device and a mask exposure method, belongs to the field of display technology. The mask plate includes a tray with at least one mask locating slot, and a mask is arranged in each mask locating slot. By the mask plate, the mask exposure device and the mask exposure method provided by the present disclosure, an effective mask with a closed-loop shaped opening may be provided, thereby improving a quality of a film formed on a substrate.
Public/Granted literature
- US20170090280A1 MASK PLATE, MASK EXPOSURE DEVICE AND MASK EXPOSURE METHOD Public/Granted day:2017-03-30
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