Invention Grant
- Patent Title: Multi-layer wiring structure, magnetic element and manufacturing method thereof
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Application No.: US14931580Application Date: 2015-11-03
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Publication No.: US10068693B2Publication Date: 2018-09-04
- Inventor: Chun-Chih Lin , Yi-Wei Chen , Yi-Ting Lai , Chu-keng Lin , Cheng-Chang Lee
- Applicant: CYNTEC CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: CYNTEC CO., LTD.
- Current Assignee: CYNTEC CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Kirton McConkie
- Agent Evan R. Witt
- Priority: TW104123654A 20150722
- Main IPC: H01F27/32
- IPC: H01F27/32 ; H01F27/28 ; H01F27/24 ; H05K1/16 ; H05K1/09 ; H05K1/02 ; H05K3/20

Abstract:
A multi-layer wiring structure includes a first conductive structure, a second conductive structure and an insulating layer. To manufacturing the multi-layer wiring structure, a first conductive structure and a second conductive structure are provided. The first conductive structure and the second conductive structure include a plurality of wiring patterns. Then, the insulating layer is disposed between the first conductive structure and the second conductive structure. The insulting layer is thinner than the first conductive structure or the second conductive structure. The first conductive structure, the insulating layer and the second conductive structure are laminated to form the multi-layer wiring structure. A planar magnetic element having a compact coil manufactured by the method is also provided.
Public/Granted literature
- US20170027061A1 MULTI-LAYER WIRING STRUCTURE, MAGNETIC ELEMENT AND MANUFACTURING METHOD THEREOF Public/Granted day:2017-01-26
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