Various embodiments include fin-type field effect transistor (FinFET) structures. In some cases, a FinFET structure includes: a substrate; a silicon-controlled rectifier (SCR) over the substrate, the SCR including: a p-well region and an adjacent n-well region over the substrate; and a negatively charged fin over the p-well region; and a Schottky diode electrically coupled with the SCR, the Schottky diode spanning between the p-well region and the n-well region, the Schottky diode for controlling electrostatic discharge (ESD) across the negatively charged fin and the n-well region.