Invention Grant
- Patent Title: Method for analysis of thermal resistance
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Application No.: US14775127Application Date: 2013-12-24
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Publication No.: US10094792B2Publication Date: 2018-10-09
- Inventor: Jiangen Pan , Cong Chen , Yan Huang
- Applicant: EVERFINE PHOTO-E-INFO CO., LTD.
- Agency: Kratz, Quintos & Hanson, LLP
- Priority: CN201310351643 20130813
- International Application: PCT/CN2013/090321 WO 20131224
- International Announcement: WO2015/021726 WO 20150219
- Main IPC: G01K17/00
- IPC: G01K17/00 ; G01N25/18 ; G01N25/20 ; G06F11/30

Abstract:
The present invention provides a method for analysis of thermal structures, not only to reduce analysis errors caused by temperature measurement errors, but also to get the thermal resistance of contact interfaces and the internal resistance distribution of heat conduction components of a DUT, by establishing a heat conduction model of the DUT, solving and analyzing a mathematic heat conduction model on the basis of temperature data of a heat source and thermal model parameters, thus realizing the accurate quantitative analysis of thermal resistance structure of the DUT, comprehensively evaluating the thermal contact conditions inside the whole DUT, and providing an important basis for improving the heat dissipation design of LED and other devices. The analysis method features in simplicity, high accuracy, high speed, wide application range, etc.
Public/Granted literature
- US20160041112A1 METHOD FOR ANALYSIS OF THERMAL RESISTANCE Public/Granted day:2016-02-11
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