Invention Grant
- Patent Title: Photomask and method of forming fine pattern using the same
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Application No.: US14671822Application Date: 2015-03-27
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Publication No.: US10095103B2Publication Date: 2018-10-09
- Inventor: Kwang Woo Park , Jun Hyuk Woo , Jeong Won Kim , Seung Bo Shim , Jin Ho Ju
- Applicant: Samsung Display Co. Ltd.
- Applicant Address: KR
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR
- Agency: Innovation Counsel LLP
- Priority: KR10-2014-0180095 20141215
- Main IPC: G03F1/52
- IPC: G03F1/52 ; G02B5/20 ; G03F1/54 ; G03F7/20
Abstract:
A photomask is provided. A photomask, comprising: a transparent substrate; and a plurality of filter layers disposed on the transparent substrate, wherein the filter layers include a first filter layer, which selectively transmits first-wavelength light therethrough, and a second filter layer, which selectively transmits second-wavelength light therethrough.
Public/Granted literature
- US20160170295A1 PHOTOMASK AND METHOD OF FORMING FINE PATTERN USING THE SAME Public/Granted day:2016-06-16
Information query
