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公开(公告)号：US09902925B2
公开(公告)日：2018-02-27
申请号：US14964267
申请日：2015-12-09
发明人： Dong Eon Lee , Jin Ho Ju , Jun Hyuk Woo , Seok Ho Lee
CPC分类号： C11D7/3245 , C11D3/3947 , C11D3/3956 , C11D7/08 , C11D7/265 , C11D7/3209 , C11D11/0047 , H01L21/02057
摘要： There is provided a cleaner composition for a process of manufacturing a semiconductor and a display. The cleaner composition includes 0.01 to 5.0 wt % of amino acid-based chelating agent, 0.01 to 1.5 wt % of organic acid, 0.01 to 1.0 wt % of inorganic acid, 0.01 to 5.0 wt % of alkali compound, and the balance of deionized water and is based on acidic water with pH levels of 1 to 5. The cleaner composition may enhance metal contaminants removal capability and have a function to remove particles and organic contaminants, and prevent corrosion of copper and reverse adsorption of copper. Thus, cleaner composition may be used for various purposes of etching copper, removing residues, and a cleaner by adjusting an etch rate.
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公开(公告)号：US09389515B2
公开(公告)日：2016-07-12
申请号：US14677823
申请日：2015-04-02
发明人： Jeong Won Kim , Jin Ho Ju , Jong Kwang Lee , Min Kang , Tae Gyun Kim
CPC分类号： G03F7/40 , G02F1/134309 , G02F1/13439 , G03F7/0226 , G03F7/023 , G03F7/30
摘要： A method for forming a pattern includes forming a photosensitive film by coating a photosensitive resin composition on a substrate, exposing the photosensitive film to light through a mask that includes a light transmission region and a non-light transmission region, coating a developing solution on the photosensitive film, and forming a photosensitive film pattern by baking the photosensitive film, wherein the photosensitive resin composition includes an alkali soluble base resin, a photoacid generator and a photoactive compound.
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3.发明申请PHASE SHIFT MASK, METHOD FOR MANUFACTURING THE SAME, AND METHOD FOR FORMING MICRO PATTERN 有权相位移掩模，其制造方法和形成微型图案的方法公开(公告)号：US20160170294A1
公开(公告)日：2016-06-16
申请号：US14691530
申请日：2015-04-20
发明人： Yong SON , Min Kang , Bong Yeon Kim , Hyun Joo Lee , Jin Ho Ju
摘要： A phase shift mask enables much smaller scale of electronic circuit pattern. A phase shift mask comprises a transparent substrate, a phase shift pattern arranged on the transparent substrate to change a phase of light that penetrates the transparent substrate, and a metal coating layer arranged on at least a part of a surface of the phase shift pattern.
摘要翻译： 相移掩模可实现更小规模的电子电路图案。 相移掩模包括透明基板，布置在透明基板上以改变穿透透明基板的光的相位的相移图案，以及布置在相移图案的表面的至少一部分上的金属涂层。
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4.发明申请THIN FILM TRANSISTOR ARRAY SUBSTRATE, METHOD FOR MANUFACTURING THE SAME, AND LIQUID CRYSTAL DISPLAY INCLUDING THE SAME 审中-公开薄膜晶体管阵列基板，其制造方法和包括其的液晶显示器公开(公告)号：US20160062200A1
公开(公告)日：2016-03-03
申请号：US14605853
申请日：2015-01-26
发明人： Yang Ho Jung , Hoon Kang , Chul Won Park , Koichi Sugitani , Jin Ho Ju
IPC分类号： G02F1/1362 , H01L29/786 , H01L29/66 , H01L23/532 , H01L21/02 , H01L27/12 , H01L29/49
CPC分类号： G02F1/136286 , G02F1/136209 , G02F2001/13629 , H01L23/53209 , H01L23/53228 , H01L23/53257 , H01L27/124 , H01L27/1292 , H01L29/42384 , H01L29/4908 , H01L29/66765 , H01L29/78603 , H01L29/78633 , H01L29/78669 , H01L2924/0002 , H01L2924/00
摘要： A thin film transistor array substrate. The thin film transistor array substrate includes a stacked structure of: a light permeable substrate having a trench; a light blocking layer partially or entirely accommodated in the trench; a gate wiring formed on the light blocking layer; a semiconductor pattern layer formed on the gate wiring; and a data wiring formed on the semiconductor pattern layer.
摘要翻译： 薄膜晶体管阵列基板。 薄膜晶体管阵列基板包括：具有沟槽的透光基板的层叠结构; 部分或完全容纳在沟槽中的遮光层; 在所述遮光层上形成的栅极布线; 形成在栅极配线上的半导体图案层; 以及形成在半导体图案层上的数据布线。
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公开(公告)号：US20150205153A1
公开(公告)日：2015-07-23
申请号：US14338123
申请日：2014-07-22
发明人： Koichi Sugitani , Yang-Ho Jung , Hoon Kang , Jin Ho Ju
IPC分类号： G02F1/1341 , G02F1/1368 , G02F1/1339 , G02F1/1333
CPC分类号： G02F1/133377
摘要： A liquid crystal display includes: a substrate including a major surface; a thin film transistor disposed over the substrate; a pixel electrode connected to the thin film transistor and disposed over the thin film transistor; a common electrode facing the pixel electrode; a roof layer disposed over the common electrode; a microcavity disposed between the pixel electrode and the common electrode; and a liquid crystal material contained in the microcavity, in which a side wall of the microcavity has an angle of 80° to 90° with respect to the major surface.
摘要翻译： 液晶显示器包括：包括主表面的基板; 设置在所述基板上的薄膜晶体管; 连接到薄膜晶体管并设置在薄膜晶体管上的像素电极; 面对像素电极的公共电极; 设置在公共电极上的屋顶层; 设置在像素电极和公共电极之间的微腔; 以及包含在微腔中的液晶材料，其中微腔的侧壁相对于主表面具有80°至90°的角度。
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公开(公告)号：US11889733B2
公开(公告)日：2024-01-30
申请号：US17036237
申请日：2020-09-29
发明人： Young Do Kim , Jin Ho Ju , Jang Doo Lee
IPC分类号： H10K59/38 , H10K50/86 , H10K50/842 , H10K59/40
CPC分类号： H10K59/38 , H10K50/8426 , H10K50/865 , H10K59/40
摘要： A display device according to an embodiment includes: a substrate; a light emitting diode; an input sensing member disposed on the light emitting diode; a color conversion layer and a light blocking member disposed on the input sensing member; an adhesive layer disposed on the color conversion layer and the light blocking member; and a window bonded to the adhesive layer, wherein a storage modulus of the adhesive layer may be 0.2 MPa or less at −20° C., and a glass transition temperature (Tg) of the adhesive layer may be −30° C. or less.
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公开(公告)号：US10290781B2
公开(公告)日：2019-05-14
申请号：US15357000
申请日：2016-11-21
发明人： Young Do Kim , Jin Ho Ju , Min Kang , Woo Sub Shim
摘要： Provided is a color filter array panel. The color filter array panel according to exemplary embodiments of the present invention includes: a substrate; a color filter disposed on the substrate and including a colorant including at least one of a pigment and a dye, and a solid fluorescent material; and a light source unit supplying light to the color filter, in which the solid fluorescent material is an aggregation induced emission enhancement (AIEE) material of which a liquid state is solidified to increase fluorescence efficiency.
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公开(公告)号：US09581848B2
公开(公告)日：2017-02-28
申请号：US14338123
申请日：2014-07-22
发明人： Koichi Sugitani , Yang-Ho Jung , Hoon Kang , Jin Ho Ju
IPC分类号： G02F1/136 , G02F1/1333
CPC分类号： G02F1/133377
摘要： A liquid crystal display includes: a substrate including a major surface; a thin film transistor disposed over the substrate; a pixel electrode connected to the thin film transistor and disposed over the thin film transistor; a common electrode facing the pixel electrode; a roof layer disposed over the common electrode; a microcavity disposed between the pixel electrode and the common electrode; and a liquid crystal material contained in the microcavity, in which a side wall of the microcavity has an angle of 80° to 90° with respect to the major surface.
摘要翻译： 液晶显示器包括：包括主表面的基板; 设置在所述基板上的薄膜晶体管; 连接到薄膜晶体管并设置在薄膜晶体管上的像素电极; 面对像素电极的公共电极; 设置在公共电极上的屋顶层; 设置在像素电极和公共电极之间的微腔; 以及包含在微腔中的液晶材料，其中微腔的侧壁相对于主表面具有80°至90°的角度。
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9.发明授权Photosensitive resin composition, method of forming pattern, and liquid crystal display using the same 有权感光树脂组合物，形成图案的方法和使用其的液晶显示器公开(公告)号：US09389451B2
公开(公告)日：2016-07-12
申请号：US14173634
申请日：2014-02-05
发明人： Hoon Kang , Jae-Sung Kim , Jin-Young Choi , Koichi Sugitani , Ki-Hyun Cho , Jin Ho Ju , Byung-Uk Kim , Joo-Pyo Yun , Hyoc-Min Youn
IPC分类号： C09K19/00 , G02F1/1333 , G03F7/004
CPC分类号： G02F1/133345 , G03F7/0045 , Y10T428/10 , Y10T428/1059 , Y10T428/1077
摘要： A photosensitive resin composition is disclosed. The disclosed photosensitive resin composition includes an acryl-based copolymer formed by copolymerizing i) unsaturated carboxylic acid, unsaturated carboxylic acid anhydride, or a mixture thereof, and ii) an olefin-based unsaturated compound or a mixture thereof, a dissolution inhibitor in which a phenolic hydroxyl group is protected by an acid-degradable acetal or ketal group, a photoacid generator, and a solvent.
摘要翻译： 公开了一种感光性树脂组合物。 所公开的感光性树脂组合物包括通过使i）不饱和羧酸，不饱和羧酸酐或其混合物共聚形成的丙烯酸类共聚物，和ii）烯烃系不饱和化合物或其混合物，其中， 酚羟基被酸可降解的缩醛或缩酮基，光致酸发生剂和溶剂保护。
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10.发明授权公开(公告)号：US09239518B2
公开(公告)日：2016-01-19
申请号：US14161939
申请日：2014-01-23
发明人： Jin Ho Ju , Seung Bo Shim , Jun Gi Kim , Yang-Ho Jung , Hyang-Shik Kong , Byung-Uk Kim , Jin-Sun Kim , Tae-Hoon Yeo , Hyoc-Min Youn , Sang-Hoon Lee
CPC分类号： G03F7/0233 , G03F7/0048 , G03F7/022 , G03F7/0226 , G03F7/0751 , G03F7/0755 , G03F7/322 , G03F7/38
摘要： A photosensitive resin composition includes: an acrylic copolymer comprising a polymerization product of a first monomer comprising at least one selected from an unsaturated carboxylic acid and an unsaturated carboxylic acid anhydride, and a second monomer comprising an olefin-based unsaturated compound; a photosensitive component comprising at least one 1,2-quinonediazide-5-sulfonic acid ester compound selected from compounds represented by Chemical Formulae 1 to 4; a coupling agent; and a solvent, wherein a total amount of asymmetric compounds in the photosensitive component is greater than or equal to 45 area percent as determined by high performance liquid chromatography: wherein R1 is a hydroxyl group or a methyl group, and NQD is a 1,2-quinonediazide 5-sulfonyl group.
摘要翻译： 感光性树脂组合物包括：包含含有选自不饱和羧酸和不饱和羧酸酐中的至少一种的第一单体的聚合产物和包含烯烃类不饱和化合物的第二单体的丙烯酸共聚物; 包含至少一种选自化学式1至4所示化合物的1,2-醌二叠氮化物-5-磺酸酯化合物的光敏组分; 偶联剂; 和溶剂，其中通过高效液相色谱法测定的感光组分中不对称化合物的总量大于或等于45面积％：其中R1是羟基或甲基，NQD是1,2 - 醌二叠氮化物5-磺酰基。
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