Invention Grant
- Patent Title: Thin film transistor, method for manufacturing the same, and semiconductor device
-
Application No.: US15856685Application Date: 2017-12-28
-
Publication No.: US10096623B2Publication Date: 2018-10-09
- Inventor: Toshikazu Kondo , Hideyuki Kishida
- Applicant: Semiconductor Energy Laboratory Co., Ltd.
- Applicant Address: JP Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Kanagawa-ken
- Agency: Robinson Intellectual Property Law Office
- Agent Eric J. Robinson
- Priority: JP2009-037912 20090220
- Main IPC: H01L29/00
- IPC: H01L29/00 ; H01L27/12 ; H01L29/786 ; H01L21/02 ; H01L29/66 ; H01L29/49 ; H01L29/24 ; H01L29/45 ; H01L21/477 ; H01L27/32

Abstract:
In a thin film transistor, an increase in off current or negative shift of the threshold voltage is prevented. In the thin film transistor, a buffer layer is provided between an oxide semiconductor layer and each of a source electrode layer and a drain electrode layer. The buffer layer includes a metal oxide layer which is an insulator or a semiconductor over a middle portion of the oxide semiconductor layer. The metal oxide layer functions as a protective layer for suppressing incorporation of impurities into the oxide semiconductor layer. Therefore, in the thin film transistor, an increase in off current or negative shift of the threshold voltage can be prevented.
Public/Granted literature
- US20180190680A1 THIN FILM TRANSISTOR, METHOD FOR MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE Public/Granted day:2018-07-05
Information query
IPC分类: