- 专利标题: Subthreshold metal oxide semiconductor for large resistance
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申请号: US14642309申请日: 2015-03-09
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公开(公告)号: US10128823B2公开(公告)日: 2018-11-13
- 发明人: Mazhareddin Taghivand , Yashar Rajavi , Alireza Khalili
- 申请人: QUALCOMM Incorporated
- 申请人地址: US CA San Diego
- 专利权人: QUALCOMM Incorporated
- 当前专利权人: QUALCOMM Incorporated
- 当前专利权人地址: US CA San Diego
- 代理机构: Patterson & Sheridan, L.L.P.
- 主分类号: H03L5/00
- IPC分类号: H03L5/00 ; H03K5/08 ; H03H11/24 ; H03H1/02
摘要:
Certain aspects of the present disclosure generally relate to generating a large electrical resistance. One example circuit generally includes a first transistor having a gate, a source connected with a first node of the circuit, and a drain connected with a second node of the circuit. The circuit may also include a voltage-limiting device connected between the gate and the source of the first transistor, wherein the device, if forward biased, is configured to limit a gate-to-source voltage of the first transistor such that the first transistor operates in a sub-threshold region. The circuit may further include a second transistor configured to bias the voltage-limiting device with a current, wherein a drain of the second transistor is connected with the gate of the first transistor, a gate of the second transistor is connected with the first node, and a source of the second transistor is connected with an electric potential.
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