Invention Grant
- Patent Title: Semiconductor device and method for manufacturing the same
-
Application No.: US15292544Application Date: 2016-10-13
-
Publication No.: US10134766B2Publication Date: 2018-11-20
- Inventor: Masahiko Hayakawa , Yuta Moriya , Junya Goto , Yasuyuki Arai
- Applicant: Semiconductor Energy Laboratory Co., Ltd.
- Applicant Address: JP Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Kanagawa-ken
- Agency: Robinson Intellectual Property Law Office
- Agent Eric J. Robinson
- Priority: JP2011-017082 20110128
- Main IPC: H01L27/12
- IPC: H01L27/12 ; G02F1/1339 ; G02F1/1345 ; G02F1/136 ; G02F1/1362 ; G09G3/36

Abstract:
The number of photolithography steps used for manufacturing a transistor is reduced to less than the conventional one and a highly reliable semiconductor device is provided. The present invention relates to a semiconductor device including a circuit including a transistor having an oxide semiconductor layer over a first substrate and a second substrate fixed to the first substrate with a sealant. A closed space surrounded by the sealant, the first substrate, and the second substrate is in a reduced pressure state or filled with dry air. The sealant surrounds at least the transistor and has a closed pattern shape. Further, the circuit is a driver circuit including a transistor having an oxide semiconductor layer.
Public/Granted literature
- US20170033129A1 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2017-02-02
Information query
IPC分类: