Invention Grant
- Patent Title: Method for transistor design with considerations of process, voltage and temperature variations
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Application No.: US15344346Application Date: 2016-11-04
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Publication No.: US10146896B2Publication Date: 2018-12-04
- Inventor: Jing Wang , Nuo Xu , Woosung Choi
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Lewis Roca Rothgerber Christie LLP
- Main IPC: G06F17/00
- IPC: G06F17/00 ; G06F17/50 ; H01L27/02 ; H01L29/06 ; H01L29/423 ; H01L29/45

Abstract:
A method for selecting transistor design parameters. A first set of simulations is used to calculate leakage current at a plurality of sets of design parameter values, and the results are fitted with a first response surface methodology model. The first model is used to generate a function that returns a value of a selected design parameter, for which a leakage current specification is just met. A second set of simulations is used to calculate effective drive current for a plurality of sets of design parameter values, and the results are fitted with a second response surface methodology model. The second model is used, together with the first, to search for a set of design parameter values at which a worst-case effective drive current is greatest, subject to the constraint of meeting the worst-case leakage current specification.
Public/Granted literature
- US20180075179A1 METHOD FOR TRANSISTOR DESIGN WITH CONSIDERATIONS OF PROCESS, VOLTAGE AND TEMPERATURE VARIATIONS Public/Granted day:2018-03-15
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