- 专利标题： Process flagging and cluster detection without requiring reconstruction
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申请号： US15377979申请日： 2016-12-13
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公开(公告)号： US10151985B2公开(公告)日： 2018-12-11
- 发明人: Remco Dirks , Seyed Iman Mossavat , Hugo Augustinus Joseph Cramer
- 申请人： ASML NETHERLANDS B.V.
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 优先权： EP15201233 20151218
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; G06F17/50
摘要：
A method including determining one or more statistical features from data obtained from a lithography process, a lithography apparatus, a substrate processed by the lithography process or the lithography apparatus, wherein determining the one or more statistical features does not include reconstructing a characteristic of the lithography process, of the lithography apparatus, or of the substrate.
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