Invention Grant
- Patent Title: Process flagging and cluster detection without requiring reconstruction
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Application No.: US15377979Application Date: 2016-12-13
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Publication No.: US10151985B2Publication Date: 2018-12-11
- Inventor: Remco Dirks , Seyed Iman Mossavat , Hugo Augustinus Joseph Cramer
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: EP15201233 20151218
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G06F17/50
Abstract:
A method including determining one or more statistical features from data obtained from a lithography process, a lithography apparatus, a substrate processed by the lithography process or the lithography apparatus, wherein determining the one or more statistical features does not include reconstructing a characteristic of the lithography process, of the lithography apparatus, or of the substrate.
Public/Granted literature
- US20170176869A1 PROCESS FLAGGING AND CLUSTER DETECTION WITHOUT REQUIRING RECONSTRUCTION Public/Granted day:2017-06-22
Information query
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