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公开(公告)号：US10151985B2
公开(公告)日：2018-12-11
申请号：US15377979
申请日：2016-12-13
Applicant: ASML NETHERLANDS B.V.
Inventor： Remco Dirks , Seyed Iman Mossavat , Hugo Augustinus Joseph Cramer
Abstract: A method including determining one or more statistical features from data obtained from a lithography process, a lithography apparatus, a substrate processed by the lithography process or the lithography apparatus, wherein determining the one or more statistical features does not include reconstructing a characteristic of the lithography process, of the lithography apparatus, or of the substrate.
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Patent Agency Ranking
公开(公告)号：US10592618B2
公开(公告)日：2020-03-17
申请号：US15209290
申请日：2016-07-13
Applicant: ASML Netherlands B.V.
IPC: G06F17/50 , H01L21/66 , H01L21/3065 , H01L21/308 , G03F7/20
Abstract: Parameters of a structure (900) are measured by reconstruction from observed diffracted radiation. The method includes the steps: (a) defining a structure model to represent the structure in a two- or three-dimensional model space; (b) using the structure model to simulate interaction of radiation with the structure; and (c) repeating step (b) while varying parameters of the structure model. The structure model is divided into a series of slices (a-f) along at least a first dimension (Z) of the model space. By the division into slices, a sloping face (904, 906) of at least one sub-structure is approximated by a series of steps (904′, 906′) along at least a second dimension of the model space (X). The number of slices may vary dynamically as the parameters vary. The number of steps approximating said sloping face is maintained constant. Additional cuts (1302, 1304) are introduced, without introducing corresponding steps.
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公开(公告)号：US11429763B2
公开(公告)日：2022-08-30
申请号：US16806266
申请日：2020-03-02
Applicant: ASML Netherlands B.V.
IPC: G06F30/20 , H01L21/66 , H01L21/3065 , H01L21/308 , G03F7/20
Abstract: Parameters of a structure (900) are measured by reconstruction from observed diffracted radiation. The method includes the steps: (a) defining a structure model to represent the structure in a two- or three-dimensional model space; (b) using the structure model to simulate interaction of radiation with the structure; and (c) repeating step (b) while varying parameters of the structure model. The structure model is divided into a series of slices (a-f) along at least a first dimension (Z) of the model space. By the division into slices, a sloping face (904, 906) of at least one sub-structure is approximated by a series of steps (904′, 906′) along at least a second dimension of the model space (X). The number of slices may vary dynamically as the parameters vary. The number of steps approximating said sloping face is maintained constant. Additional cuts (1302, 1304) are introduced, without introducing corresponding steps.
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公开(公告)号：US11994806B2
公开(公告)日：2024-05-28
申请号：US17436947
申请日：2020-02-26
Applicant: ASML NETHERLANDS B.V.
Inventor： Alexandru Onose , Remco Dirks , Roger Hubertus Elisabeth Clementine Bosch , Sander Silvester Adelgondus Marie Jacobs , Frank Jaco Buijnsters , Siebe Tjerk De Zwart , Artur Palha Da Silva Clerigo , Nick Verheul
IPC: G03F7/00
CPC classification number: G03F7/705 , G03F7/70625 , G03F7/70633 , G03F7/706841 , G03F7/70616
Abstract: A method, computer program and associated apparatuses for metrology. The method includes determining a reconstruction recipe describing at least nominal values for use in a reconstruction of a parameterization describing a target. The method includes obtaining first measurement data relating to measurements of a plurality of targets on at least one substrate, the measurement data relating to one or more acquisition settings and performing an optimization by minimizing a cost function which minimizes differences between the first measurement data and simulated measurement data based on a reconstructed parameterization for each of the plurality of targets. A constraint on the cost function is imposed based on a hierarchical prior. Also disclosed is a hybrid model method comprising obtaining a coarse model operable to provide simulated coarse data; and training a data driven model to correct the simulated coarse data so as to determine simulated data for use in reconstruction.
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公开(公告)号：US11556060B2
公开(公告)日：2023-01-17
申请号：US16556637
申请日：2019-08-30
Applicant: ASML Netherlands B.V.
Inventor： Seyed Iman Mossavat , Bastiaan Onne Fagginger Auer , Remco Dirks , Alexandru Onose , Hugo Augustinus Joseph Cramer
Abstract: Methods for calibrating metrology apparatuses and determining a parameter of interest are disclosed. In one arrangement, training data is provided that comprises detected representations of scattered radiation detected by each of plural metrology apparatuses. An encoder encodes each detected representation to provide an encoded representation, and a decoder generates a synthetic detected representation from the respective encoded representation. A classifier estimates from which metrology apparatus originates each encoded representation or each synthetic detected representation. The training data is used to simultaneously perform, in an adversarial relationship relative to each other, a first machine learning process involving the encoder or decoder and a second machine learning process involving the classifier.
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公开(公告)号：US20170176869A1
公开(公告)日：2017-06-22
申请号：US15377979
申请日：2016-12-13
Applicant: ASML NETHERLANDS B.V.
Inventor： Remco Dirks , Seyed Iman Mossavat , Hugo Augustinus Joseph Cramer
CPC classification number: G03F7/70508 , G03F7/70533 , G03F7/70633 , G03F7/70641 , G06F17/5081
Abstract: A method including determining one or more statistical features from data obtained from a lithography process, a lithography apparatus, a substrate processed by the lithography process or the lithography apparatus, wherein determining the one or more statistical features does not include reconstructing a characteristic of the lithography process, of the lithography apparatus, or of the substrate.
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