Invention Grant
- Patent Title: Small wafer area MEMs switch
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Application No.: US15650788Application Date: 2017-07-14
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Publication No.: US10173888B2Publication Date: 2019-01-08
- Inventor: Bucknell C. Webb
- Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION , Bucknell C. Webb
- Applicant Address: US NY Armonk
- Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee Address: US NY Armonk
- Agent Thomas A. Beck; Daniel P. Morris
- Main IPC: B81B3/00
- IPC: B81B3/00 ; B81C1/00 ; G01R33/02 ; G01R33/028 ; H01H51/22

Abstract:
Deep via technology is used to construct an integrated silicon cantilever and cavity oriented in a vertical plane which creates an electrostatically-switched MEMS switch in a small wafer area. Another embodiment is a small wafer area electrostatically-switched, vertical-cantilever MEMS switch wherein the switch cavity is etched within a volume defined by walls grown internally within a silicon substrate using through vias.
Public/Granted literature
- US20170341930A1 SMALL WAFER AREA MEMS SWITCH Public/Granted day:2017-11-30
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