Invention Grant
- Patent Title: Method and apparatus for inspection and metrology
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Application No.: US15569086Application Date: 2016-04-19
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Publication No.: US10185224B2Publication Date: 2019-01-22
- Inventor: Ferry Zijp , Duygu Akbulut , Peter Danny Van Voorst , Jeroen Johan Maarten Van De Wijdeven , Koos Van Berkel
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: EP15166233 20150504
- International Application: PCT/EP2016/058640 WO 20160419
- International Announcement: WO2016/177568 WO 20161110
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/72 ; G03F7/20 ; G02B21/00 ; G01N21/956 ; G01B11/14 ; G02B5/30

Abstract:
A method involving providing incident radiation of a first polarization state by an optical component into an interface of an object with an external environment, wherein a surface is provided adjacent the interface and separated by a gap from the interface, detecting, from incident radiation reflected from the interface and from the surface, radiation of a second different polarization state arising from the reflection of incident radiation of the first polarization at the interface as distinct from the radiation of the first polarization state in the reflected radiation, and producing a position signal representative of a relative position between the focus of the optical component and the object.
Public/Granted literature
- US20180120714A1 METHOD AND APPARATUS FOR INSPECTION AND METROLOGY Public/Granted day:2018-05-03
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