- 专利标题: Shadow mask alignment and management system
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申请号: US15076523申请日: 2016-03-21
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公开(公告)号: US10199660B2公开(公告)日: 2019-02-05
- 发明人: Byung-Sung Leo Kwak , Stefan Bangert , Ralf Hofmann , Michael Koenig
- 申请人: Applied Materials, Inc.
- 申请人地址: US CA Santa Clara
- 专利权人: Applied Materials, Inc.
- 当前专利权人: Applied Materials, Inc.
- 当前专利权人地址: US CA Santa Clara
- 代理机构: Schwabe, Williamson & Wyatt, P.C.
- 主分类号: H01M6/40
- IPC分类号: H01M6/40 ; H01M4/13 ; H01M4/139 ; H01M4/58 ; H01M4/62 ; H01M4/66 ; C23C14/04 ; H01M4/02
摘要:
A magnetic handling assembly for thin-film processing of a substrate, a system and method for assembling and disassembling a shadow mask to cover a top of a workpiece for exposure to a processing condition. The assembly may include a magnetic handling carrier and a shadow mask disposed over, and magnetically coupled to, the magnetic handling carrier to cover a top of a workpiece that is to be disposed between the shadow mask and the magnetic handling carrier when exposed to a processing condition. A system includes a first chamber with a first support to hold the shadow mask, a second support to hold a handling carrier, and an alignment system to align the shadow mask a workpiece to be disposed between the carrier and shadow mask. The first and second supports are moveable relative to each other.
公开/授权文献
- US20160204451A1 SHADOW MASK ALIGNMENT AND MANAGEMENT SYSTEM 公开/授权日:2016-07-14
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