Invention Grant
- Patent Title: Plasma processing apparatus and plasma processing method
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Application No.: US14751655Application Date: 2015-06-26
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Publication No.: US10204763B2Publication Date: 2019-02-12
- Inventor: Takao Funakubo , Hirofumi Haga , Shinichi Kozuka , Wataru Ozawa , Akihiro Sakamoto , Naoki Taniguchi , Hiroshi Tsujimoto , Kumiko Ono
- Applicant: TOKYO ELECTRON LIMITED
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Rothwell, Figg, Ernst & Manbeck, P.C.
- Priority: JP2014-134500 20140630; JP2014-186820 20140912
- Main IPC: H01J37/32
- IPC: H01J37/32

Abstract:
A controller disclosed herein drives, in a first step, a high frequency generating source at a first energy condition, and drives, in a second step, a high frequency generating source at a second energy condition. Prior to a switching time of the first step and the second step, the controller switches gas species supplied from the gas supply system into the processing container, and sets a gas flow rate in an initial period just after the switching to be larger than a gas flow rate in a stabilization period after lapse of the initial period.
Public/Granted literature
- US20150380282A1 PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD Public/Granted day:2015-12-31
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