Invention Grant
- Patent Title: Transmissive optical shutter and method of fabricating the same
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Application No.: US14719850Application Date: 2015-05-22
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Publication No.: US10205861B2Publication Date: 2019-02-12
- Inventor: Sanghun Lee , Changyoung Park , Yonghwa Park
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: Sughrue Mion, PLLC
- Priority: KR10-2014-0107762 20140819
- Main IPC: G02F1/015
- IPC: G02F1/015 ; H04N5/225 ; G02F1/017

Abstract:
A transmissive optical shutter and a method of fabricating the same are provided. The transmissive optical shutter includes a first contact layer, an epitaxial layer disposed over the first contact layer, the epitaxial layer being configured to modulate intensity of incident light having a specific wavelength, a second contact layer disposed on the epitaxial layer, a first electrode disposed on the first contact layer, at least one second electrode disposed on the second contact layer, and a substrate disposed under the first contact layer.
Public/Granted literature
- US20160057404A1 TRANSMISSIVE OPTICAL SHUTTER AND METHOD OF FABRICATING THE SAME Public/Granted day:2016-02-25
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