- 专利标题： Fabrication of microfluidic channels in diamond
-
申请号： US15610553申请日： 2017-05-31
-
公开(公告)号： US10217648B1公开(公告)日： 2019-02-26
- 发明人: David F. Brown , Keisuke Shinohara , Miroslav Micovic , Alexandros Margomenos , Andrea Corrion , Hector L. Bracamontes , Ivan Alvarado-Rodriguez
- 申请人： HRL Laboratories, LLC
- 申请人地址： US CA Malibu
- 专利权人： HRL Laboratories, LLC
- 当前专利权人： HRL Laboratories, LLC
- 当前专利权人地址： US CA Malibu
- 代理机构： North Shore Associates
- 主分类号： H01L21/00
- IPC分类号： H01L21/00 ; H01L21/48 ; H01L23/373 ; H01L23/46
摘要：
Methods using chemical vapor deposition (CVD) of diamond deposited on a sacrificial material provide CVD diamond microchannel structures and 3-D interconnection structures of CVD diamond microfluidic channels. The sacrificial material is patterned to define locations and dimensions of the microchannels. The patterned sacrificial material is selectively removed from underneath the chemical vapor deposited (CVD) diamond to form the CVD diamond microchannels. The CVD diamond microchannels are integrated with electronic structures to provide an integral microfluidic cooling system to electronic devices.
信息查询
IPC分类:
