Invention Grant
- Patent Title: Method and system for planning metrology measurements
-
Application No.: US15121479Application Date: 2015-02-26
-
Publication No.: US10222710B2Publication Date: 2019-03-05
- Inventor: Matthew Sendelbach , Niv Sarig , Charles N. Archie
- Applicant: NOVA MEASURING INSTRUMENTS LTD.
- Applicant Address: IL Rehovot
- Assignee: NOVA MEASURING INSTRUMENTS LTD.
- Current Assignee: NOVA MEASURING INSTRUMENTS LTD.
- Current Assignee Address: IL Rehovot
- Agency: Browdy and Neimark, P.L.L.C
- International Application: PCT/IL2015/050216 WO 20150226
- International Announcement: WO2015/128866 WO 20150903
- Main IPC: G03F7/20
- IPC: G03F7/20 ; H04B17/309 ; H01J37/28 ; H04B17/391

Abstract:
A method for use in planning metrology measurements, the method comprising: providing inverse total measurement uncertainty (TMU) analysis equations for upper and lower confidence limits TMUUL and TMULL of the TMU being independent on prior knowledge of measurements by a tool under test (TuT) and a reference measurement system (RMS), thereby enabling estimation of input parameters for said equations prior to conducting an experiment of the TMU analysis; and determining at least one of a total number N of samples to be measured in the TMU analysis and an average number ns of measurements per sample by the RMS.
Public/Granted literature
- US20160363872A1 METHOD AND SYSTEM FOR PLANNING METROLOGY MEASUREMENTS Public/Granted day:2016-12-15
Information query
IPC分类: