Invention Grant
- Patent Title: Defect inspection device and defect inspection method
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Application No.: US15127686Application Date: 2015-01-22
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Publication No.: US10228332B2Publication Date: 2019-03-12
- Inventor: Toshifumi Honda , Yuta Urano , Shunichi Matsumoto , Taketo Ueno , Yuko Otani
- Applicant: Hitachi High-Technologies Corporation
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Crowell & Moring LLP
- Priority: JP2014-074098 20140331
- International Application: PCT/JP2015/051720 WO 20150122
- International Announcement: WO2015/151557 WO 20151008
- Main IPC: G01N21/956
- IPC: G01N21/956 ; G01N21/95 ; G01N21/47 ; G01N21/88

Abstract:
A defect inspection method includes irradiating a sample with laser, condensing and detecting scattered light beams, processing signals that detectors have detected and extracting a defect on a sample surface, and outputting information on the extracted defect. Detection of the scattered light beams is performed by condensing the scattered light beams, adjusting polarization directions of the condensed scattered light beams, mutually separating the light beams depending on the polarization direction, and detecting the light beams by a plurality of detectors. Extraction of the defect is performed by processing output signals from the detectors by multiplying each detection signal by a gain, discriminating between a noise and the defect, and detecting the defect.
Public/Granted literature
- US20170146463A1 Defect Inspection Device and Defect Inspection Method Public/Granted day:2017-05-25
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