Invention Grant
- Patent Title: Movable support and lithographic apparatus
-
Application No.: US15736297Application Date: 2016-04-28
-
Publication No.: US10228626B2Publication Date: 2019-03-12
- Inventor: Antonius Franciscus Johannes De Groot , Theo Anjes Maria Ruijl , Christiaan Louis Valentin , Christian Werner
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: EP15176135 20150709
- International Application: PCT/EP2016/059508 WO 20160428
- International Announcement: WO2017/005387 WO 20170112
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03B27/58 ; H01L21/027 ; H01L21/68

Abstract:
A movable support configured to support an object, the support including: a support plane to support the object, an actuator assembly to move the movable support in a first direction and in a second direction perpendicular to the first direction, wherein the first direction and the second direction extend in a plane parallel to the support plane, wherein the actuator assembly includes: a first actuator configured to exert a first actuation force in a first actuation direction, the first actuation direction being parallel to the support plane, a second actuator configured to exert a second actuation force in a second actuation direction, the second actuation direction being parallel to the support plane, wherein the first actuation direction and the second actuation direction are arranged non-parallel and non-perpendicular with respect to each other.
Public/Granted literature
- US20180356738A1 MOVABLE SUPPORT AND LITHOGRAPHIC APPARATUS Public/Granted day:2018-12-13
Information query
IPC分类: