- 专利标题: Movable support and lithographic apparatus
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申请号: US15736297申请日: 2016-04-28
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公开(公告)号: US10228626B2公开(公告)日: 2019-03-12
- 发明人: Antonius Franciscus Johannes De Groot , Theo Anjes Maria Ruijl , Christiaan Louis Valentin , Christian Werner
- 申请人: ASML Netherlands B.V.
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Pillsbury Winthrop Shaw Pittman LLP
- 优先权: EP15176135 20150709
- 国际申请: PCT/EP2016/059508 WO 20160428
- 国际公布: WO2017/005387 WO 20170112
- 主分类号: G03F7/20
- IPC分类号: G03F7/20 ; G03B27/58 ; H01L21/027 ; H01L21/68
摘要:
A movable support configured to support an object, the support including: a support plane to support the object, an actuator assembly to move the movable support in a first direction and in a second direction perpendicular to the first direction, wherein the first direction and the second direction extend in a plane parallel to the support plane, wherein the actuator assembly includes: a first actuator configured to exert a first actuation force in a first actuation direction, the first actuation direction being parallel to the support plane, a second actuator configured to exert a second actuation force in a second actuation direction, the second actuation direction being parallel to the support plane, wherein the first actuation direction and the second actuation direction are arranged non-parallel and non-perpendicular with respect to each other.
公开/授权文献
- US20180356738A1 MOVABLE SUPPORT AND LITHOGRAPHIC APPARATUS 公开/授权日:2018-12-13
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