Invention Grant
- Patent Title: Field effect transistor and method for manufacturing the same, and display device
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Application No.: US14778144Application Date: 2015-05-19
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Publication No.: US10230001B2Publication Date: 2019-03-12
- Inventor: Hongyuan Xu , Hsiang Chih Hsiao , Chang I Su
- Applicant: Shenzhen China Star Optoelectronics Technology Co., Ltd.
- Applicant Address: CN Shenzhen
- Assignee: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Shenzhen
- Priority: CN201510232927 20150508
- International Application: PCT/CN2015/079327 WO 20150519
- International Announcement: WO2016/179849 WO 20161117
- Main IPC: H01L29/786
- IPC: H01L29/786 ; H01L27/28 ; H01L29/423 ; H01L29/66 ; H01L51/00 ; H01L51/05

Abstract:
Disclosed are a field effect transistor and method for manufacturing the same, and a display device. The field effect transistor includes: a source and a drain which are spaced apart from each other; a semi-conductor layer arranged between the source and the drain; a first gate layer located on a side of the semi-conductor layer; and a second gate layer located on the other side of the semi-conductor layer. The field effect transistor provided by the present disclosure is less energy-consuming; a method for manufacturing the same is low costing; and a display device using the same is also less energy-consuming.
Public/Granted literature
- US20170104104A1 FIELD EFFECT TRANSISTOR AND METHOD FOR MANUFACTURING THE SAME, AND DISPLAY DEVICE Public/Granted day:2017-04-13
Information query
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