- Patent Title: Method and system for spectroscopic beam profile metrology including a detection of collected light according to wavelength along a third dimension of a hyperspectral detector
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Application No.: US16100843Application Date: 2018-08-10
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Publication No.: US10234271B2Publication Date: 2019-03-19
- Inventor: Jiyou Fu , Noam Sapiens , Kevin A. Peterlinz , Stilian Ivanov Pandev
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Spano Law Group
- Agent Joseph S. Spano
- Main IPC: G01B11/00
- IPC: G01B11/00 ; G01B11/24 ; G03F7/00 ; G01N21/21 ; G01N21/956

Abstract:
A spectroscopic beam profile metrology system simultaneously detects measurement signals over a large wavelength range and a large range of angles of incidence (AOI). In one aspect, a multiple wavelength illumination beam is reshaped to a narrow line shaped beam of light before projection onto a specimen by a high numerical aperture objective. After interaction with the specimen, the collected light is passes through a wavelength dispersive element that projects the range of AOIs along one direction and wavelength components along another direction of a two-dimensional detector. Thus, the measurement signals detected at each pixel of the detector each represent a scatterometry signal for a particular AOI and a particular wavelength. In another aspect, a hyperspectral detector is employed to simultaneously detect measurement signals over a large wavelength range, range of AOIs, and range of azimuth angles.
Public/Granted literature
- US20180347961A1 Methods And Systems For Spectroscopic Beam Profile Metrology Public/Granted day:2018-12-06
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