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公开(公告)号：US10365211B2
公开(公告)日：2019-07-30
申请号：US16033511
申请日：2018-07-12
Applicant: KLA-Tencor Corporation
Inventor： Barry Blasenheim , Noam Sapiens , Michael Friedmann
Abstract: Methods and systems for measuring a specimen while actively stabilizing an optical measurement beam subject to changes in polarization by a rotating polarizer element are described herein. Movement of a focused measurement beam spot induced by a rotating polarizer element is compensated by actively controlling the position of an optical element in the beam path based on measurements of the focused measurement beam spot. Both feedback and feedforward control schemes may be employed to reduce beam position error. In one aspect, a measurement system includes a rotating optical polarizer, a beam position sensor, and an active beam compensating element in the illumination beam path, the collection beam path, or both. Beam position errors are detected by the beam position sensor, and control commands are communicated to the active beam compensating element to reduce the measured beam position errors.
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公开(公告)号：US10261014B2
公开(公告)日：2019-04-16
申请号：US14583447
申请日：2014-12-26
Applicant: KLA-Tencor Corporation
Inventor： Noam Sapiens , Joel Seligson , Vladimir Levinski , Daniel Kandel , Yoel Feler , Barak Bringoltz , Amnon Manassen , Eliav Benisty
Abstract: Metrology systems and methods are provided herein, which comprise an optical element that is positioned between an objective lens of the system and a target. The optical element is arranged to enhance evanescent modes of radiation reflected by the target. Various configurations are disclosed: the optical element may comprise a solid immersion lens, a combination of Moiré-elements and solid immersion optics, dielectric-metal-dielectric stacks of different designs, and resonating elements to amplify the evanescent modes of illuminating radiation. The metrology systems and methods are configurable to various metrology types, including imaging and scatterometry methods.
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公开(公告)号：US10072921B2
公开(公告)日：2018-09-11
申请号：US14960121
申请日：2015-12-04
Applicant: KLA-Tencor Corporation
Inventor： Jiyou Fu , Noam Sapiens , Kevin A. Peterlinz , Stilian Ivanov Pandev
IPC: G01B11/24 , G01B11/00 , G03F7/00 , G01N21/956 , G01N21/21
CPC classification number: G01B11/002 , G01B11/24 , G01B2210/56 , G01N21/956 , G01N2021/213 , G03F7/00
Abstract: A spectroscopic beam profile metrology system simultaneously detects measurement signals over a large wavelength range and a large range of angles of incidence (AOI). In one aspect, a multiple wavelength illumination beam is reshaped to a narrow line shaped beam of light before projection onto a specimen by a high numerical aperture objective. After interaction with the specimen, the collected light is passes through a wavelength dispersive element that projects the range of AOIs along one direction and wavelength components along another direction of a two-dimensional detector. Thus, the measurement signals detected at each pixel of the detector each represent a scatterometry signal for a particular AOI and a particular wavelength. In another aspect, a hyperspectral detector is employed to simultaneously detect measurement signals over a large wavelength range, range of AOIs, and range of azimuth angles.
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公开(公告)号：US10062157B2
公开(公告)日：2018-08-28
申请号：US15342432
申请日：2016-11-03
Applicant: KLA-Tencor Corporation
Inventor： Stilian Ivanov Pandev , Alexander Kuznetsov , Gregory R. Brady , Andrei V. Shchegrov , Noam Sapiens , John J. Hench
CPC classification number: G06T7/0004 , G01B2210/56 , G01N21/211 , G01N21/255 , G01N21/84 , G01N21/8422 , G01N2201/06113 , G03F7/70625 , G03F7/70633 , G06T7/60 , G06T2207/10004 , G06T2207/30148
Abstract: Disclosed are apparatus and methods for determining a structure or process parameter value of a target of interest on a semiconductor wafer. A plurality of collection patterns are defined for a spatial light beam controller positioned at a pupil image plane of a metrology tool. For each collection pattern, a signal is collected from a sensor of the metrology tool, and each collected signal represents a combination of a plurality of signals that the spatial light beam controller samples, using each collection pattern, from a pupil image of the target of interest. The collection patterns are selected so that the pupil image is reconstructable based on the collection patterns and their corresponding collection signals. The collected signal for each of the collection patterns is analyzed to determine a structure or process parameter value for the target of interest.
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公开(公告)号：US20160161245A1
公开(公告)日：2016-06-09
申请号：US14960121
申请日：2015-12-04
Applicant: KLA-Tencor Corporation
Inventor： Jiyou Fu , Noam Sapiens , Kevin A. Peterlinz , Stilian Ivanov Pandev
CPC classification number: G01B11/002 , G01B11/24 , G01B2210/56 , G01N21/956 , G01N2021/213 , G03F7/00
Abstract: A spectroscopic beam profile metrology system simultaneously detects measurement signals over a large wavelength range and a large range of angles of incidence (AOI). In one aspect, a multiple wavelength illumination beam is reshaped to a narrow line shaped beam of light before projection onto a specimen by a high numerical aperture objective. After interaction with the specimen, the collected light is passes through a wavelength dispersive element that projects the range of AOIs along one direction and wavelength components along another direction of a two-dimensional detector. Thus, the measurement signals detected at each pixel of the detector each represent a scatterometry signal for a particular AOI and a particular wavelength. In another aspect, a hyperspectral detector is employed to simultaneously detect measurement signals over a large wavelength range, range of AOIs, and range of azimuth angles.
Abstract translation: 分光光束分布测量系统同时检测大波长范围和大范围入射角（AOI）的测量信号。 在一个方面，多波长照明光束在通过高数值孔径物镜投影到样本上之前重新成形为窄线形的光束。 在与样品相互作用后，所收集的光通过沿着一个方向投影AOI范围的波长色散元件，并沿着二维检测器的另一方向波长成分。 因此，在检测器的每个像素处检测的测量信号各自表示用于特定AOI和特定波长的散射测量信号。 另一方面，采用高光谱检测器来同时检测大波长范围，AOI范围和方位角范围内的测量信号。
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Patent Agency Ranking
6.发明申请APPARATUS, TECHNIQUES, AND TARGET DESIGNS FOR MEASURING SEMICONDUCTOR PARAMETERS 有权用于测量半导体参数的设备，技术和目标设计公开(公告)号：US20150323471A1
公开(公告)日：2015-11-12
申请号：US14708058
申请日：2015-05-08
Applicant: KLA-Tencor Corporation
Inventor： Noam Sapiens , Andrei V. Shchegrov , Stilian Ivanov Pandev
IPC: G01N21/956 , G01N21/95 , G01N21/93 , G01B11/00
CPC classification number: G01N21/93 , G01B2210/56 , G01N21/4788 , G01N21/9501 , G01N21/95607 , G01N2201/06113 , G01N2201/062 , G01N2201/10 , G01N2201/1296
Abstract: In one embodiment, apparatus and methods for determining a parameter of a target are disclosed. A target having an imaging structure and a scatterometry structure is provided. An image of the imaging structure is obtained with an imaging channel of a metrology tool. A scatterometry signal is also obtained from the scatterometry structure with a scatterometry channel of the metrology tool. At least one parameter, such as overlay error, of the target is determined based on both the image and the scatterometry signal.
Abstract translation: 在一个实施例中，公开了用于确定目标的参数的装置和方法。 提供具有成像结构和散射测量结构的目标。 使用计量工具的成像通道获得成像结构的图像。 散射测量信号也通过散度仪结构与计量工具的散射测量通道获得。 基于图像和散射测量信号确定目标的至少一个参数，例如重叠误差。
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公开(公告)号：US20150198524A1
公开(公告)日：2015-07-16
申请号：US14583447
申请日：2014-12-26
Applicant: KLA-Tencor Corporation
Inventor： Noam Sapiens , Joel Seligson , Vladimir Levinski , Daniel Kandel , Yoel Feler , Barak Bringoltz , Amnon Manassen , Eliav Benisty
IPC: G01N21/47
CPC classification number: G01N21/4788 , G01N2201/06113 , G02B27/56 , G02B27/58
Abstract: Metrology systems and methods are provided herein, which comprise an optical element that is positioned between an objective lens of the system and a target. The optical element is arranged to enhance evanescent modes of radiation reflected by the target. Various configurations are disclosed: the optical element may comprise a solid immersion lens, a combination of Moiré-elements and solid immersion optics, dielectric-metal-dielectric stacks of different designs, and resonating elements to amplify the evanescent modes of illuminating radiation. The metrology systems and methods are configurable to various metrology types, including imaging and scatterometry methods.
Abstract translation: 本文提供的计量系统和方法包括位于系统的物镜和目标之间的光学元件。 光学元件布置成增强目标反射的辐射消散模式。 公开了各种配置：光学元件可以包括固体浸没透镜，莫尔元件和固体浸没光学元件的组合，不同设计的介电金属 - 电介质叠层以及用于放大照明辐射的渐逝模式的谐振元件。 计量系统和方法可配置为各种计量类型，包括成像和散射方法。
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公开(公告)号：US10690602B2
公开(公告)日：2020-06-23
申请号：US15896978
申请日：2018-02-14
Applicant: KLA-Tencor Corporation
Inventor： Noam Sapiens , Shankar Krishnan , David Y. Wang , Alexander Buettner , Kerstin Purrucker , Kevin A. Peterlinz
IPC: G01N21/95 , G01B11/06 , G01J3/42 , G01N21/956 , H01L21/66 , G01J3/02 , G01J3/36 , G01J3/10 , G01J3/28 , G01N21/84 , G01N21/21
Abstract: Methods and systems for performing spectroscopic measurements of semiconductor structures including ultraviolet, visible, and infrared wavelengths greater than two micrometers are presented herein. A spectroscopic measurement system includes a combined illumination source including a first illumination source that generates ultraviolet, visible, and near infrared wavelengths (wavelengths less than two micrometers) and a second illumination source that generates mid infrared and long infrared wavelengths (wavelengths of two micrometers and greater). Furthermore, the spectroscopic measurement system includes one or more measurement channels spanning the range of illumination wavelengths employed to perform measurements of semiconductor structures. In some embodiments, the one or more measurement channels simultaneously measure the sample throughout the wavelength range. In some other embodiments, the one or more measurement channels sequentially measure the sample throughout the wavelength range.
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公开(公告)号：US10648796B2
公开(公告)日：2020-05-12
申请号：US15885504
申请日：2018-01-31
Applicant: KLA-Tencor Corporation
Inventor： Noam Sapiens , Kevin A. Peterlinz , Alexander Buettner , Kerstin Purrucker , Andrei V. Shchegrov
IPC: G01B11/24 , G03F7/20 , G01N21/21 , G01N21/956
Abstract: Methods and systems are presented to reduce the illumination spot size projected onto a measurement target and associated spillover onto area surrounding a measurement target. In one aspect, a spatial light modulator (SLM) is located in the illumination path between the illumination light source and the measurement sample. The SLM is configured to modulate amplitude, phase, or both, across the path of the illumination light to reduce wavefront errors. In some embodiments, the desired state of the SLM is based on wavefront measurements performed in an optical path of the metrology system. In another aspect, an illumination aperture having an image plane tilted at an oblique angle with respect to a beam of illumination light is employed to overcome defocusing effects in metrology systems that employ oblique illumination of the measurement sample. In some embodiments, the illumination aperture, objective lens, and specimen are aligned to satisfy the Scheimpflug condition.
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公开(公告)号：US10107765B2
公开(公告)日：2018-10-23
申请号：US15671661
申请日：2017-08-08
Applicant: KLA-Tencor Corporation
Inventor： Noam Sapiens , Andrei V. Shchegrov , Stilian Ivanov Pandev
IPC: G01N21/93 , G01N21/95 , G01N21/956 , G01N21/47
Abstract: In one embodiment, apparatus and methods for determining a parameter of a target are disclosed. A target having an imaging structure and a scatterometry structure is provided. An image of the imaging structure is obtained with an imaging channel of a metrology tool. A scatterometry signal is also obtained from the scatterometry structure with a scatterometry channel of the metrology tool. At least one parameter, such as overlay error, of the target is determined based on both the image and the scatterometry signal.
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