Invention Grant
- Patent Title: Ultraviolet disinfection system
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Application No.: US15820184Application Date: 2017-11-21
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Publication No.: US10246348B2Publication Date: 2019-04-02
- Inventor: Douglas A. Collins , Li Zhang , Yitao Liao
- Applicant: RayVio Corporation
- Applicant Address: US CA Hayward
- Assignee: RayVio Corporation
- Current Assignee: RayVio Corporation
- Current Assignee Address: US CA Hayward
- Agency: Patent Law Group LLP
- Agent Brian D. Ogonowsky
- Main IPC: C02F1/32
- IPC: C02F1/32 ; C02F1/00

Abstract:
Embodiments of the invention include an elongate chamber. A UV source includes a semiconductor device, the semiconductor device including an active layer disposed between an n-type region and a p-type region. The active layer emits radiation having a peak wavelength in a UV range. The semiconductor device is positioned on a wall of the elongate chamber. An inner surface of the elongate chamber is reflective.
Public/Granted literature
- US20180093904A1 ULTRAVIOLET DISINFECTION SYSTEM Public/Granted day:2018-04-05
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