- 专利标题： Lithographic apparatus and device manufacturing method
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申请号： US15338116申请日： 2016-10-28
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公开(公告)号： US10248034B2公开(公告)日： 2019-04-02
- 发明人: Christiaan Alexander Hoogendam , Bob Streefkerk , Johannes Catharinus Hubertus Mulkens , Erik Theodorus Maria Bijlaart , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Bernardus Antonius Slaghekke , Patricius Aloysius Jacobus Tinnemans , Helmar Van Santen
- 申请人： ASML NETHERLANDS B.V.
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 优先权： EP03256820 20031028
- 主分类号： G03F7/20
- IPC分类号： G03F7/20
摘要：
Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.
公开/授权文献
- US20170045830A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 公开/授权日：2017-02-16
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