Invention Grant
- Patent Title: Pulsed plasma analyzer and method for analyzing the same
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Application No.: US15727198Application Date: 2017-10-06
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Publication No.: US10249485B2Publication Date: 2019-04-02
- Inventor: Vladimir Volynets , Protopopov Vladimir , Young Do Kim , Yuri Barsukov , Sang Heon Lee , Sung Ho Jang
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si, Gyeonggi-Do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si, Gyeonggi-Do
- Agency: F. Chau & Associates, LLC.
- Priority: KR10-2016-0149469 20161110
- Main IPC: G01J3/30
- IPC: G01J3/30 ; H01J49/40 ; C23C16/455 ; G01J3/443 ; H01J37/32 ; H01J49/00 ; H01J49/10 ; H01J49/12 ; H01L21/02 ; H01L29/786 ; G01J3/28

Abstract:
A pulsed plasma analyzer includes a pulse modulator that controls an off-time of a pulsed plasma that includes a target radical, an optical spectrometer that measures optical emissions of the pulsed plasma after the off-time to determine optical emission data, and a concentration estimating module that estimates a concentration of the target radical during the off-time based on an initial optical emission value of the optical emission data that changes as a function of the off-time, and outputs an estimated concentration.
Public/Granted literature
- US20180130651A1 PULSED PLASMA ANALYZER AND METHOD FOR ANALYZING THE SAME Public/Granted day:2018-05-10
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