- Patent Title: Device and method for detecting semiconductor substrate thickness
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Application No.: US15279356Application Date: 2016-09-28
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Publication No.: US10250258B2Publication Date: 2019-04-02
- Inventor: Andreas Bernardus Maria Jansman , Franciscus Petrus Widdershoven , Viet Thanh Dinh
- Applicant: NXP B.V.
- Applicant Address: NL Eindhoven
- Assignee: NXP B.V.
- Current Assignee: NXP B.V.
- Current Assignee Address: NL Eindhoven
- Main IPC: H03K19/003
- IPC: H03K19/003 ; H01L23/00 ; H01L29/861 ; H01L27/06 ; G06F21/75 ; H01L29/06

Abstract:
Embodiments of devices and method for detecting semiconductor substrate thickness are disclosed. In an embodiment, an IC device includes a semiconductor substrate, a charge emitter embedded in the semiconductor substrate and configured to produce an electrical charge in the semiconductor substrate and a charge sensor embedded in the semiconductor substrate and configured to generate a response signal in response to the electrical charge produced in the semiconductor substrate. The magnitude of the response signal depends on the thickness of the semiconductor substrate.
Public/Granted literature
- US20180091147A1 DEVICE AND METHOD FOR DETECTING SEMICONDUCTOR SUBSTRATE THICKNESS Public/Granted day:2018-03-29
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