- 专利标题: Process for forming transfer film
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申请号: US15092324申请日: 2016-04-06
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公开(公告)号: US10252499B2公开(公告)日: 2019-04-09
- 发明人: Eiichi Takahashi , Nobuhiro Koga , Yasuyuki Imaizumi
- 申请人: Eiichi Takahashi , Nobuhiro Koga , Yasuyuki Imaizumi
- 申请人地址: JP Tokyo
- 专利权人: YOSHINO KOGYOSHO CO., LTD.
- 当前专利权人: YOSHINO KOGYOSHO CO., LTD.
- 当前专利权人地址: JP Tokyo
- 代理机构: Oliff PLC
- 优先权: JP2005-102325 20050331
- 主分类号: B32B27/08
- IPC分类号: B32B27/08 ; B32B7/12 ; B32B27/34 ; B32B27/32 ; B32B27/36 ; B32B7/06 ; B44C1/17 ; B65D35/08 ; B32B37/14 ; B32B37/00 ; B32B37/06 ; B32B37/10
摘要:
A process includes forming a transfer film without a release layer in which the transfer film includes a substrate layer to be peeled off during a transfer process, and a transfer layer to be transferred to an article to be decorated. The transfer layer has a protective layer, a printed or vapor-deposited decorative layer, and an adhering layer, which are laminated in this order. The substrate layer is a base film of a synthetic resin formed by extruding a molten synthetic resin. The substrate layer is so laminated and thermally compressed in direct contact with the protective layer such that the substrate layer does not peel off the protective layer before the transfer process and peels off the protective layer from a peeled end portion of the substrate layer as a trigger during the transfer process, by thermally pressing the substrate layer and the protective layer between rolls.
公开/授权文献
- US20160214362A1 PROCESS FOR FORMING TRANSFER FILM 公开/授权日:2016-07-28
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