- Patent Title: High-purity quinoline derivative and method for manufacturing same
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Application No.: US15503108Application Date: 2015-08-26
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Publication No.: US10259791B2Publication Date: 2019-04-16
- Inventor: Taiju Nakamura , Taichi Abe , Yusuke Miyashita , Hirofumi Kuroda , Yusuke Ayata , Atsushi Akao
- Applicant: Eisai R&D Management Co., Ltd.
- Applicant Address: JP Tokyo
- Assignee: Eisai R&D Management Co., Ltd.
- Current Assignee: Eisai R&D Management Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Fish & Richardson P.C.
- Priority: JP2014-174062 20140828; JP2015-034729 20150225
- International Application: PCT/JP2015/073946 WO 20150826
- International Announcement: WO2016/031841 WO 20160303
- Main IPC: C07D215/48
- IPC: C07D215/48 ; A61K31/47
Abstract:
Provided is a compound represented by formula (IV) or a salt thereof, wherein the content of the compound represented by formula (I) is 350 ppm by mass or less.
Public/Granted literature
- US20170233344A1 HIGH-PURITY QUINOLINE DERIVATIVE AND METHOD FOR MANUFACTURING SAME Public/Granted day:2017-08-17
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