Invention Grant
- Patent Title: Virtual metrology system and method
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Application No.: US14485280Application Date: 2014-09-12
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Publication No.: US10261504B2Publication Date: 2019-04-16
- Inventor: Feng-Chi Chung , Ching-Hsing Hsieh , Yi-Chun Lin , Chien-Chuan Yu
- Applicant: United Microelectronics Corp.
- Applicant Address: TW Hsinchu
- Assignee: United Microelectronics Corp.
- Current Assignee: United Microelectronics Corp.
- Current Assignee Address: TW Hsinchu
- Agency: J.C. Patents
- Priority: TW103126779A 20140805
- Main IPC: G05B23/02
- IPC: G05B23/02 ; G03F7/20

Abstract:
A virtual metrology system and a method therefor are provided herein. In the system, a set of process data is gathered and clustered according to a plurality of predetermined patterns. The clustered set of process data is calculated according to the corresponding pattern, so as to obtain a comparison result. If the obtained result meets a desired output, a corresponding step is performed based on the result. In one case, the corresponding step is a normal sampling step if the clustered set of process data meets the corresponding pattern. If the clustered set of process data does not meet the corresponding pattern, an alarm is generated thereby, and the corresponding equipment may be shut down. In another case, the corresponding step is a maintenance, repair, and overhaul step if the clustered set of process data meets the corresponding pattern.
Public/Granted literature
- US20160041548A1 VIRTUAL METROLOGY SYSTEM AND METHOD Public/Granted day:2016-02-11
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