公开(公告)号：US20160041548A1

公开(公告)日：2016-02-11

申请号：US14485280

申请日：2014-09-12

Applicant: United Microelectronics Corp.

Inventor： Feng-Chi Chung ,  Ching-Hsing Hsieh ,  Yi-Chun Lin ,  Chien-Chuan Yu

IPC: G05B19/401

CPC classification number: G05B23/0221 ,  G03F7/70608 ,  G03F7/70616

Abstract: A virtual metrology system and a method therefor are provided herein. In the system, a set of process data is gathered and clustered according to a plurality of predetermined patterns. The clustered set of process data is calculated according to the corresponding pattern, so as to obtain a comparison result. If the obtained result meets a desired output, a corresponding step is performed based on the result. In one case, the corresponding step is a normal sampling step if the clustered set of process data meets the corresponding pattern. If the clustered set of process data does not meet the corresponding pattern, an alarm is generated thereby, and the corresponding equipment may be shut down. In another case, the corresponding step is a maintenance, repair, and overhaul step if the clustered set of process data meets the corresponding pattern.

Abstract translation: 本文提供了虚拟计量系统及其方法。 在该系统中，根据多个预定模式收集和聚类一组过程数据。 根据相应的模式计算聚类过程数据集，以获得比较结果。 如果获得的结果满足期望的输出，则基于该结果执行相应的步骤。 在一种情况下，如果聚集的过程数据集合满足相应模式，相应步骤是正常采样步骤。 如果集群过程数据不符合相应模式，则会产生报警，并且相应的设备可能会关闭。 在另一种情况下，相应的步骤是维护，修复和大修步骤，如果集群过程数据符合相应的模式。

公开(公告)号：US10935969B2

公开(公告)日：2021-03-02

申请号：US16285067

申请日：2019-02-25

Applicant: United Microelectronics Corp.

Inventor： Feng-Chi Chung ,  Ching-Hsing Hsieh ,  Yi-Chun Lin ,  Chien-Chuan Yu

IPC: G05B23/02 ,  G03F7/20

Abstract: A virtual metrology system at least includes a process apparatus including a set of process data, the process apparatus producing a workpiece according to the set of process data. A virtual metrology server is configured to gather the set of process data, cluster the set of process data to obtain data clusters, and compare the data clusters with patterns. If the data clusters meet the patterns corresponding to the data clusters, performing a corresponding maintenance, repair, and overhaul step on the process apparatus.

公开(公告)号：US20190187674A1

公开(公告)日：2019-06-20

申请号：US16285067

申请日：2019-02-25

Applicant: United Microelectronics Corp.

Inventor： Feng-Chi Chung ,  Ching-Hsing Hsieh ,  Yi-Chun Lin ,  Chien-Chuan Yu

IPC: G05B23/02

CPC classification number: G05B23/0221 ,  G03F7/70608 ,  G03F7/70616

Abstract: A virtual metrology system at least includes a process apparatus including a set of process data, the process apparatus producing a workpiece according to the set of process data. A virtual metrology server is configured to gather the set of process data, cluster the set of process data to obtain data clusters, and compare the data clusters with patterns. If the data clusters meet the patterns corresponding to the data clusters, performing a corresponding maintenance, repair, and overhaul step on the process apparatus.

公开(公告)号：US10261504B2

公开(公告)日：2019-04-16

申请号：US14485280

申请日：2014-09-12

Applicant: United Microelectronics Corp.

Inventor： Feng-Chi Chung ,  Ching-Hsing Hsieh ,  Yi-Chun Lin ,  Chien-Chuan Yu

IPC: G05B23/02 ,  G03F7/20

Abstract: A virtual metrology system and a method therefor are provided herein. In the system, a set of process data is gathered and clustered according to a plurality of predetermined patterns. The clustered set of process data is calculated according to the corresponding pattern, so as to obtain a comparison result. If the obtained result meets a desired output, a corresponding step is performed based on the result. In one case, the corresponding step is a normal sampling step if the clustered set of process data meets the corresponding pattern. If the clustered set of process data does not meet the corresponding pattern, an alarm is generated thereby, and the corresponding equipment may be shut down. In another case, the corresponding step is a maintenance, repair, and overhaul step if the clustered set of process data meets the corresponding pattern.