Invention Grant
- Patent Title: Workpiece processing chamber having a thermal controlled microwave window
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Application No.: US14293114Application Date: 2014-06-02
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Publication No.: US10269541B2Publication Date: 2019-04-23
- Inventor: Michael W. Stowell , Qiwei Liang
- Applicant: APPLIED MATERIALS, INC.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Fish & Richardson P.C.
- Main IPC: C23C16/00
- IPC: C23C16/00 ; C23F1/00 ; H01L21/306 ; H01J37/32
Abstract:
A plasma reactor has a microwave source including a microwave window with a channel extending through the window and a coolant source for flowing a coolant through the channel. The coolant is a liquid that does not absorb microwave power.
Public/Granted literature
- US20150348757A1 WORKPIECE PROCESSING CHAMBER HAVING A THERMAL CONTROLLED MICROWAVE WINDOW Public/Granted day:2015-12-03
Information query
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