- 专利标题: Resin composition, copper paste, and semiconductor device
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申请号: US15750866申请日: 2016-07-27
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公开(公告)号: US10276277B2公开(公告)日: 2019-04-30
- 发明人: Tomoyuki Takahashi
- 申请人: NAMICS CORPORATION
- 申请人地址: JP Niigata
- 专利权人: NAMICS CORPORATION
- 当前专利权人: NAMICS CORPORATION
- 当前专利权人地址: JP Niigata
- 代理机构: Rankin, Hill & Clark LLP
- 优先权: JP2015-161608 20150819
- 国际申请: PCT/JP2016/071984 WO 20160727
- 国际公布: WO2017/029953 WO 20170223
- 主分类号: H01B1/22
- IPC分类号: H01B1/22 ; C09D5/24 ; C09J9/02 ; C09J161/06 ; H01L23/00 ; H05K1/09
摘要:
An object of the present invention is to provide a resin composition suitable for copper pastes, which can be cured in an ambient atmosphere and has a viscosity within an appropriate range and a low specific resistance after curing. This resin composition includes (A) a copper powder, (B) a thermosetting resin, (C) a fatty acid, (D) an amine, and (E) 4-aminosalicylic acid. Preferably, the (B) component is resol-type phenolic resin. More preferably, the (C) component is at least one selected from oleic acid, linoleic acid, linolenic acid, stearic acid, palmitic acid, lauric acid, butyric acid, and propionic acid.
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