Invention Grant
- Patent Title: Method of manufacturing imprint master template
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Application No.: US15620704Application Date: 2017-06-12
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Publication No.: US10281817B2Publication Date: 2019-05-07
- Inventor: Taewoo Kim , Eunjung Kim , Seung-Won Park , Daehwan Jang , Hyungbin Cho , Gugrae Jo
- Applicant: Samsung Display Co., Ltd.
- Applicant Address: KR Yongin-si
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Yongin-si
- Agency: H.C. Park & Associates, PLC
- Priority: KR10-2016-0124202 20160927
- Main IPC: G03F7/22
- IPC: G03F7/22 ; G03F7/00 ; G03F7/038 ; G03F7/09 ; G03F7/095 ; G03F7/16 ; G03F7/26
Abstract:
A method of manufacturing an imprint master template including forming a first layer pattern only in a partial region and a second layer formed in the entire region, and then a back exposure process is performed.
Public/Granted literature
- US20180088461A1 METHOD OF MANUFACTURING IMPRINT MASTER TEMPLATE Public/Granted day:2018-03-29
Information query
IPC分类:
