Invention Grant
- Patent Title: Mask and method of manufacturing the mask
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Application No.: US15157072Application Date: 2016-05-17
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Publication No.: US10287669B2Publication Date: 2019-05-14
- Inventor: Jiyun Chun
- Applicant: Samsung Display Co., Ltd.
- Applicant Address: KR Yongin-si
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Yongin-si
- Agency: H.C. Park & Associates, PLC
- Priority: KR10-2015-0144824 20151016
- Main IPC: B23K26/066
- IPC: B23K26/066 ; B23K26/386 ; B23K26/384 ; C23F1/02 ; C23C14/04 ; B23K26/06

Abstract:
A method of manufacturing a mask includes forming a first protection layer on a first surface of a mask member, the first protection layer comprising first through-holes exposing portions of the first surface; radiating, through the first through-holes, a laser beam onto the exposed portions of the first surface to form blind holes in the mask member; and providing an etchant to form second through-holes in the mask member, the second through-holes comprising the blind bores and extending from the first surface to a second surface of the mask member opposing the first surface.
Public/Granted literature
- US20170107605A1 MASK AND METHOD OF MANUFACTURING THE MASK Public/Granted day:2017-04-20
Information query
IPC分类: