Invention Grant
- Patent Title: Optimized flow control device properties for accumulated gas injection
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Application No.: US15104156Application Date: 2014-10-10
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Publication No.: US10287856B2Publication Date: 2019-05-14
- Inventor: Andrey Filippov , Jianxin Lu , Vitaly Anatolievich Khoriakov
- Applicant: Landmark Graphics Corporation
- Applicant Address: US TX Houston
- Assignee: LANDMARK GRAPHICS CORPORATION
- Current Assignee: LANDMARK GRAPHICS CORPORATION
- Current Assignee Address: US TX Houston
- International Application: PCT/US2014/060171 WO 20141010
- International Announcement: WO2015/112210 WO 20150730
- Main IPC: E21B41/00
- IPC: E21B41/00 ; E21B43/12 ; E21B43/14 ; E21B43/16 ; G01B21/20 ; G05B13/04 ; G05D7/06 ; G06F17/11 ; G06F17/50

Abstract:
A computer implemented method, system, and computer program product are provided for determining flow control device (FCD) properties for a gas injection well that would yield a prescribed shape of a gas injection front according to a target gas injection profile. An FCD distribution function is adjusted based on the results of a simulation of injected gas flow distribution in the gas injection well over a period of time. The simulation and resulting adjustment of the FCD distribution function is repeated until a convergence between a shape of a displaced oil volume front obtained using the adjusted flow control device distribution function and a target gas injection profile is reached within a predetermined convergence range. The FCD properties are then determined based on the adjusted FCD distribution function.
Public/Granted literature
- US20160312585A1 Optimized Flow Control Device Properties For Accumulated Gas Injection Public/Granted day:2016-10-27
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